What is Silane (SiH4)?
A gas compound of silicon and hydrogen used as the source for CVD of polysilicon, silicon oxide and silicon nitride. It ignites spontaneously in air, so it is handled under strict control.
Silane (SiH4) in the explanations
Silicon films from thermal decomposition of silane are amorphous below about 580 °C and polycrystalline above it.
When silicon films are deposited by thermally decomposing s…Silane is a pyrophoric gas that can ignite spontaneously on contact with air.
What is the main hazard in handling silane (SiH4), used as …Nitrous oxide (N2O) serves as the oxidant reacted with silane to form silicon oxide in plasma CVD and similar.
Which gas is sometimes used as the oxidant with silane to d…
Questions that mention Silane (SiH4) (13)
- When silicon films are deposited by thermally decomposing silane, what kind of film forms if the deposition temperature is lowered?
- What is the main hazard in handling silane (SiH4), used as a source for CVD and other processes?
- Which source gas can deposit silicon films at lower temperatures than monosilane (SiH4)?
- Which gas is sometimes used as the oxidant with silane to deposit silicon oxide or oxynitride films by CVD?
- Which gases are used as sources for silicon epitaxial growth?
- Which is closest to the typical growth temperature for silicon epitaxy using trichlorosilane?
- Which is closest to the typical growth temperature for SiC epitaxy (CVD)?
- Which source gas is commonly used to deposit polysilicon by LPCVD?
- Which liquid organosilicon compound is widely used as a source for CVD of silicon oxide?
- Which gas is used as the source for tungsten CVD?
- Which pair of source gases is used to deposit silicon nitride (Si3N4) by thermal CVD?
- Which correctly describes silicon nitride deposited by plasma CVD?
- Which gas is used as the germanium source in SiGe epitaxial growth?
Related terms
CVD Plasma Epitaxial growth LPCVD (low-pressure CVD) Step coverage Annealing Mobility Oxynitride (SiON) Phosphine (PH3) SiC (silicon carbide)