Deposition (CVD and PVD)

Which gas is used as the source for tungsten CVD?

  1. ATEOS
  2. BSilane (SiH4)
  3. CTungsten hexafluoride (WF6)
Show answer and explanation

Answer: C. Tungsten hexafluoride (WF6)

Tungsten CVD deposits tungsten films by reducing WF6 with hydrogen or silane. With good step coverage, it can fill narrow holes such as contact holes, so it has been used to form contact plugs.

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More Deposition (CVD and PVD) questions

  1. Why has high-density plasma CVD (HDP-CVD) been used to fill narrow trenches with insulator?
  2. Which correctly describes uses of silicon nitride (Si3N4) films?
  3. What is the main purpose of placing magnets behind the target in magnetron sputtering?
  4. Under what condition does CVD give good step coverage (conformality)?
  5. When silicon films are deposited by thermally decomposing silane, what kind of film forms if the deposition temperature is lowered?