What is TEOS?
Short for tetraethoxysilane, a liquid organosilicon compound widely used as the source for CVD silicon oxide. It gives oxide films with good step coverage.
Field: Deposition (CVD and PVD)
TEOS in the explanations
It deposits polysilicon, silicon nitride and TEOS oxide, but its 600–800 °C temperatures rule it out after metallization.
Which is a characteristic of low-pressure CVD (LPCVD)?TEOS (Si(OC2H5)4) is an organosilicon compound that is liquid at room temperature and is vaporized as a CVD precursor.
Which liquid organosilicon compound is widely used as a sou…
Questions that mention TEOS (3)
Related terms
CVD Step coverage LPCVD (low-pressure CVD) Precursor Silane (SiH4) Plasma ALD Area-selective deposition Electroplating Electrostatic chuck