Deposition (CVD and PVD)

When silicon films are deposited by thermally decomposing silane, what kind of film forms if the deposition temperature is lowered?

  1. ASingle-crystal silicon
  2. BAmorphous silicon
  3. CSilicon dioxide
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Answer: B. Amorphous silicon

Silicon films from thermal decomposition of silane become amorphous below about 580 °C and polycrystalline (polysilicon) above it. Films are sometimes deposited amorphous and then crystallized by heat treatment to obtain large grains.

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More Deposition (CVD and PVD) questions

  1. Which is an example of a typical material deposited by ALD?
  2. What is the main purpose of a sputtering method that ionizes sputtered atoms and draws them vertically onto the wafer with a bias?
  3. In deposition and etching equipment, which mechanism holds the wafer on the stage by electrostatic force?
  4. Which pair of source gases is used to deposit silicon nitride (Si3N4) by thermal CVD?
  5. What is the method called that sputters a titanium target in a nitrogen-containing gas to form titanium nitride (TiN) films?