Deposition (CVD and PVD)

Which liquid organosilicon compound is widely used as a source for CVD of silicon oxide?

  1. ATungsten hexafluoride (WF6)
  2. BTEOS (tetraethoxysilane)
  3. CTrimethylgallium
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Answer: B. TEOS (tetraethoxysilane)

TEOS is an organosilicon compound that is liquid at room temperature and is vaporized for use as a CVD source. It is safer to handle than silane and gives oxide with good step coverage, so it is widely used for interlayer dielectrics and similar films.

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More Deposition (CVD and PVD) questions

  1. Which gas is used as the source for tungsten CVD?
  2. Why has high-density plasma CVD (HDP-CVD) been used to fill narrow trenches with insulator?
  3. Which correctly describes uses of silicon nitride (Si3N4) films?
  4. What is the main purpose of placing magnets behind the target in magnetron sputtering?
  5. Under what condition does CVD give good step coverage (conformality)?