What is Phosphine (PH3)?
A gas compound of phosphorus and hydrogen used to introduce n-type dopant (phosphorus) into silicon. It is extremely toxic.
Phosphine (PH3) in the explanations
Phosphine and arsine are extremely toxic gases, harmful even at very low concentrations.
Which correctly describes phosphine (PH3) and arsine (AsH3)…Phosphine or diborane is added for doping.
Which gases are used as sources for silicon epitaxial growt…In-situ doping introduces dopant gases (phosphine, diborane, etc.) during growth, avoiding the crystal damage of ion implantation and the high-temperature anneal needed to activate it.
What is it called when doping gas is flowed during epitaxia…
Questions that mention Phosphine (PH3) (9)
- Which correctly describes phosphine (PH3) and arsine (AsH3), used to introduce n-type dopants?
- Why are dopant gases such as diborane and phosphine often supplied diluted to low concentrations in hydrogen, nitrogen or similar?
- What is the safety advantage of storing and supplying toxic gases such as arsine and phosphine adsorbed on a sorbent in containers below atmospheric pressure?
- Which gases are used as sources for silicon epitaxial growth?
- What is it called when doping gas is flowed during epitaxial growth to add dopants at the same time as growth?
- Which compound has been used as a liquid diffusion source for introducing phosphorus into silicon by thermal diffusion?
- Which gas is typically used in the ion source of an implanter to produce boron ions?
- What is it called when a gas containing a dopant such as phosphorus is flowed during LPCVD polysilicon deposition to make a conductive film?
- Which source gases are used to introduce the p-type dopant boron?
Related terms
Arsine (AsH3) Epitaxial growth Silane (SiH4) Ion implantation SiGe (silicon-germanium) Thermal diffusion LPCVD (low-pressure CVD) Mass flow controller (MFC) NF3 (nitrogen trifluoride) Precursor