What is Ion implantation?
A technique that ionizes impurities, accelerates them and implants them into the wafer. The dose and depth can be controlled precisely.
Field: Ion implantation
Ion implantation in the explanations
Dose—ions per unit area—sets concentration independently of depth, a key strength of ion implantation.
In ion implantation, which parameter mainly determines how …Ion implantation runs near room temperature, so photoresist can serve as the mask, and dose is controlled to about ±1% by integrating beam current.
What is the main advantage of ion implantation over thermal…Ion implantation ionizes dopants such as boron or phosphorus, selects them by mass analysis, accelerates them with an electric field and drives them into the wafer at high speed.
What is the principle of ion implantation?
Questions that mention Ion implantation (22)
- In ion implantation, which parameter mainly determines how deep the dopants are implanted (the range)?
- What is the main purpose of annealing (heat treatment) after ion implantation?
- Which is a common way to suppress channeling (ions traveling too deep through gaps in the crystal) in ion implantation?
- Which unit is used for the dose in ion implantation?
- What is the main advantage of ion implantation over thermal diffusion?
- What is used to suppress wafer charging (charge-up) during ion implantation?
- What must be considered when using photoresist as a mask for ion implantation?
- In ion implantation, how is the dose made uniform across the wafer?
- Which is an example of an application of high-energy ion implantation reaching several MeV?
- Which ion implantation is used for wafer splitting (Smart Cut) and for lifetime control in power devices?
- What is the principle of ion implantation?
- Which unit is commonly used to express the acceleration energy in ion implantation?
- Which is closest to the range of ion implantation doses used in LSI manufacturing?
- Why is the wafer cooled during high-current ion implantation?
- What is the typical distribution of crystal damage created by ion implantation?
Related terms
Annealing Thermal diffusion Photoresist Channeling Plasma Ashing CMOS Tail current SiC (silicon carbide) On-resistance