What is Photoresist?

A light-sensitive material whose solubility in developer changes when exposed. In positive resist the exposed areas dissolve; in negative resist they remain.

Field: Lithography

Photoresist in the explanations

Questions that mention Photoresist (15)

  1. What must be considered when using photoresist as a mask for ion implantation?
  2. What problem tends to arise when removing photoresist that has received a high-dose ion implant?
  3. Which correctly describes photoresist?
  4. What is the process called that removes photoresist by oxidizing it to ash with oxygen plasma or similar?
  5. What is a mask of nitride, carbon or similar material called, used when photoresist alone cannot survive as a mask, such as when etching deep holes?
  6. Which combination correctly lists the main components of chemically amplified photoresist?
  7. In ArF immersion lithography, which film is applied over the photoresist to keep the immersion water from contacting it directly?
  8. Which aqueous solution is commonly used to develop photoresist?
  9. What is the appropriate general way to store photoresist?
  10. Why can thermal oxide be used as a mask against dopants during diffusion?
  11. What is the main advantage of ion implantation over thermal diffusion?
  12. What is the main reason the beam path in an ion implanter is kept at high vacuum?
  13. What is an advantage of plasma-enhanced ALD (PEALD)?
  14. Which set correctly lists the main kinds of process materials used in semiconductor manufacturing?
  15. What is the main reason yellow lighting is used in lithography areas?

Related terms

Ion implantation Ashing Plasma Radical Hard mask 3D NAND Chemically amplified resist Immersion lithography TMAH Thermal diffusion

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