Ion implantation

Which unit is used for the dose in ion implantation?

  1. AeV
  2. Bions/cm² (number of ions per unit area)
  3. CΩ/□
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Answer: B. ions/cm² (number of ions per unit area)

Dose is the number of ions implanted per unit area of the wafer, expressed in ions/cm² (or atoms/cm²). eV is the unit of acceleration energy, and Ω/□ is the unit of sheet resistance.

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More Ion implantation questions

  1. Which is a correct technique for forming shallow junctions for the sources and drains of scaled transistors?
  2. Which correctly pairs the distribution that approximates the depth profile of implanted dopants with the term for the depth of its peak?
  3. In an ion implanter, which part uses a magnetic field to select only the desired ion species?
  4. What is the main advantage of ion implantation over thermal diffusion?
  5. What is the purpose of pre-amorphization implantation (PAI)?