What is Ashing?
Removing photoresist that is no longer needed after etching or implantation by oxidizing it to ash, typically with an oxygen plasma.
Field: Etching
Ashing in the explanations
Low-damage ashing (e.g., hydrogen-based), silylation treatments that restore damaged surfaces and post-process dehydration are therefore required.
What problem must be watched for when etching or ashing low…High-dose implants carbonize and harden the resist surface, making it hard to strip, so ashing conditions also need care.
What must be considered when using photoresist as a mask fo…Ashing it hot right away lets gas from the soft resist underneath burst the crust (popping), leaving residue and particles.
What problem tends to arise when removing photoresist that …
Questions that mention Ashing (7)
- What problem must be watched for when etching or ashing low-k films?
- What must be considered when using photoresist as a mask for ion implantation?
- What problem tends to arise when removing photoresist that has received a high-dose ion implant?
- What is the process called that removes photoresist by oxidizing it to ash with oxygen plasma or similar?
- Why are reaction products (polymers) left on pattern sidewalls removed after dry etching?
- What is the main purpose of cleaning with a mixture of sulfuric acid and hydrogen peroxide (SPM)?
- Which correctly describes how many times cleaning is performed across the whole LSI manufacturing flow?
Related terms
Photoresist Plasma Ion implantation Radical Dry etching SPM (sulfuric acid-hydrogen peroxide mixture) CMP Ultrapure water Yield ALE (atomic layer etching)