Ion implantation

Which unit is commonly used to express the acceleration energy in ion implantation?

  1. AΩ (ohms)
  2. BkeV (kilo-electron-volts)
  3. CW (watts)
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Answer: B. keV (kilo-electron-volts)

Implant energy is expressed in electron-volts, where 1 eV is the energy of a singly charged ion accelerated through 1 V. Typical ranges are a few keV to several hundred keV, and several MeV for high-energy implants.

  • A. Ω is a unit of resistance.
  • B. Correct. It is expressed in electron-volts such as keV.
  • C. W is a unit of power.
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More Ion implantation questions

  1. Which correctly pairs dopants implanted into silicon with the conductivity type they produce?
  2. Which is closest to the range of ion implantation doses used in LSI manufacturing?
  3. What is the main reason the beam path in an ion implanter is kept at high vacuum?
  4. In a typical ion implanter, in what order do ions pass through the system?
  5. When implanted into silicon at the same energy, how do the ranges of arsenic (mass 75) and phosphorus (mass 31) compare?