What is EUV lithography?
Lithography using extreme ultraviolet light with a wavelength of 13.5 nm. It uses reflective optics and a vacuum environment.
Field: Lithography
Questions that mention EUV lithography (8)
- What wavelength of light is used in EUV lithography?
- Which correctly describes masks used in EUV lithography?
- What is the main cause of the stochastic fluctuations that are a problem in EUV lithography?
- What is an advantage of metal-oxide-containing resists being developed for EUV lithography?
- Which company is effectively the sole supplier of EUV lithography tools?
- How is 13.5 nm light generated in the light source of an EUV lithography tool?
- What is the main cause of "flare", a problem in EUV lithography?
- Why has gas released from resist (outgassing) been a concern in EUV lithography?
Related terms
Line edge roughness (LER) Pattern collapse Numerical aperture (NA) Plasma OPC (optical proximity correction) ArF excimer laser Bottom anti-reflective coating (BARC) Chemically amplified resist Depth of focus (DOF) High-NA EUV