What is Multiple patterning?
Forming patterns with a pitch too fine for a single exposure by splitting them across several exposures or process steps. Splitting into two is double patterning.
Field: Lithography
Multiple patterning in the explanations
ALD offers atomic-level thickness control and excellent conformality, so it deposits high-k hafnium oxide gate dielectrics, titanium nitride for metal gates and barriers, zirconium oxide in DRAM capacitors, films around 3D NAND charge-trap layers, and spacers for multiple patterning—wherever thin, uniform films are needed.
Which is an example of a typical material deposited by ALD?It can even coat photoresist, so it forms spacers for multiple patterning.
What is an advantage of plasma-enhanced ALD (PEALD)?ArF immersion (NA 1.35, k1 0.27) gives R ≈ 39 nm; finer pitches require multiple patterning or EUV.
Based on the resolution formula R = k1 × λ / NA, how can re…
Questions that mention Multiple patterning (5)
- Which correctly describes double patterning (multiple patterning)?
- Which is an example of a typical material deposited by ALD?
- What is an advantage of plasma-enhanced ALD (PEALD)?
- Based on the resolution formula R = k1 × λ / NA, how can resolution be improved (R made smaller)?
- Which is the main reason the price per processed wafer has risen sharply as leading-edge process generations advance?
Related terms
ALD SADP (self-aligned double patterning) 3D NAND Plasma Photoresist Numerical aperture (NA) ArF excimer laser Bottom anti-reflective coating (BARC) Chemically amplified resist Depth of focus (DOF)