Lithography

What wavelength of light is used in EUV lithography?

  1. A193 nm
  2. B248 nm
  3. C13.5 nm
Show answer and explanation

Answer: C. 13.5 nm

EUV (extreme ultraviolet) lithography uses light with a wavelength of 13.5 nm. Because almost all materials absorb light at this wavelength, it uses reflective optics with multilayer mirrors instead of lenses, and the inside of the tool is kept in vacuum. 193 nm is the wavelength of ArF and 248 nm of KrF excimer lasers.

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More Lithography questions

  1. Which correctly describes positive photoresist?
  2. Which correctly describes ArF immersion lithography?
  3. Which correctly describes double patterning (multiple patterning)?
  4. How does the depth of focus (DOF) generally change when the numerical aperture (NA) of an exposure tool is increased?
  5. Which correctly describes OPC (optical proximity correction)?