Lithography

What is an advantage of metal-oxide-containing resists being developed for EUV lithography?

  1. AThey absorb EUV light strongly and have high etch resistance even as thin films
  2. BThey need no exposure
  3. CThey absorb no light at all
Show answer and explanation

Answer: A. They absorb EUV light strongly and have high etch resistance even as thin films

Metal-containing resists absorb more EUV light than organic resists, so they react with less exposure and are expected to reduce the impact of stochastic fluctuations. Their high etch resistance also lets thin films serve as masks, which helps prevent fine patterns from collapsing.

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More Lithography questions

  1. Which patterning technique uses the tendency of block copolymers to form regular fine patterns spontaneously?
  2. What is the role of lithography in semiconductor manufacturing?
  3. What was the original meaning of the word "lithography"?
  4. Which correctly describes photoresist?
  5. Which company is effectively the sole supplier of EUV lithography tools?