What is Photomask (reticle)?
The master pattern used for exposure, typically a light-blocking pattern on a quartz substrate (reflective for EUV). For reduction scanners it is made four times larger than the pattern on the wafer.
Field: Lithography
Photomask (reticle) in the explanations
Photomask patterns are written by electron-beam writers that expose resist on the mask blank directly with a beam focused to a few nm.
Which equipment is mainly used to write the patterns of pho…Patterns are written by electron beam and etched to make the photomask.
What is the material called, used to make photomasks, consi…It serves research, small-volume prototyping, photomask making and nanoimprint template fabrication.
Which correctly describes writing patterns directly into re…
Questions that mention Photomask (reticle) (6)
- What is the role of the thin membrane (pellicle) stretched over a photomask at a fixed distance?
- Which equipment is mainly used to write the patterns of photomasks (reticles)?
- What is the material called, used to make photomasks, consisting of a quartz glass substrate pre-coated with a light-blocking film and similar?
- Which correctly describes writing patterns directly into resist on the wafer with an electron beam, without a mask?
- In current scanner exposure tools, what is the typical maximum area on the wafer that can be exposed in one exposure (one shot)?
- Which method is used to make silicon interposers larger than the maximum area a lithography tool can expose at once (about 26 mm × 33 mm)?
Related terms
Pellicle OPC (optical proximity correction) Scanner High-NA EUV GPU HBM ArF excimer laser Bottom anti-reflective coating (BARC) Chemically amplified resist Depth of focus (DOF)