A resist in which acid generated by exposure catalyzes a chain of reactions during the post-exposure bake (PEB). It needs little exposure dose and is widely used from KrF onward, but is sensitive to basic contamination.
Field: Lithography
Negative-tone development uses a positive chemically amplified resist but develops it in an organic solvent (such as butyl acetate) that dissolves the unexposed areas, leaving the exposed ones.
Which method develops a positive chemically amplified resis…In a chemically amplified resist, exposure generates acid from a photoacid generator, and during the post-exposure bake (PEB, about 90–130 °C) that acid catalytically removes protecting groups from the polymer, repeating the reaction tens to hundreds of times.
Which is a characteristic of chemically amplified resists?A chemically amplified resist consists of a base resin whose solubility in developer changes, a photoacid generator that produces acid on exposure, and a solvent for coating.
Which combination correctly lists the main components of ch…Photoresist ArF excimer laser Bottom anti-reflective coating (BARC) Depth of focus (DOF) EUV lithography High-NA EUV Immersion lithography Line edge roughness (LER) Multiple patterning Nanoimprint lithography