A laser using argon and fluorine that emits 193 nm ultraviolet light. Combined with immersion, ArF immersion lithography is a leading-edge technique alongside EUV. The 248 nm version is the KrF excimer laser.
Field: Lithography
An ArF excimer laser excites a gas mixture containing argon and fluorine with an electrical discharge, emitting light at 193 nm.
Which combination of gases is used to make an ArF excimer l…Bottom anti-reflective coating (BARC) Chemically amplified resist Depth of focus (DOF) EUV lithography High-NA EUV Immersion lithography Line edge roughness (LER) Multiple patterning Nanoimprint lithography Numerical aperture (NA)