What is Silicide?
A compound of silicon and a metal, such as NiSi or TiSi2. It is formed on source, drain and gate surfaces to reduce resistance and contact resistance.
Field: Interconnect processes
Silicide in the explanations
In advanced transistors contact resistance makes up a large share of total resistance, so it is reduced with silicide formation and extremely high doping.
What is a common way to make a metal-semiconductor contact …Silicide interfaces such as titanium silicide, low-barrier materials and enlarged contact areas are also used, as advanced nodes demand specific contact resistivities around 10⁻⁹ Ω·cm².
What is the basic way to reduce metal-semiconductor contact…The treatment is often performed just before gate oxidation, epitaxy or silicide formation.
What is the main purpose of cleaning with dilute hydrofluor…
Questions that mention Silicide (4)
- What is a common way to make a metal-semiconductor contact ohmic (resistive)?
- What is the basic way to reduce metal-semiconductor contact resistance?
- What is the main purpose of cleaning with dilute hydrofluoric acid (DHF)?
- What is the purpose of forming silicides such as NiSi on the surfaces of a transistor's source, drain and gate?
Related terms
Ohmic contact Dilute hydrofluoric acid (DHF) Native oxide SC-1 (APM) SC-2 (HPM) Air gap Backside power delivery Barrier metal Black's equation Crosstalk