What is Anisotropic etching?
Etching that proceeds only in a particular direction (mainly vertically). Needed to pattern fine features.
Field: Etching
Anisotropic etching in the explanations
In anisotropic etching, vertically accelerated ion bombardment and sidewall-protecting passivation make etching proceed preferentially downward, with almost no lateral undercut beneath the mask.
Which correctly describes anisotropic etching?Plasma density (radical and ion flux) and ion energy at the wafer can be set independently, enabling fast, highly anisotropic etching at pressures of a few Pa or less; ICP tools are widely used for silicon and metal etching.
Which is a characteristic of inductively coupled plasma (IC…This potential accelerates positive ions from the plasma nearly vertically into the wafer, enabling anisotropic etching.
In plasma tools such as capacitively coupled ones, what is …
Questions that mention Anisotropic etching (4)
- Which correctly describes anisotropic etching?
- Which is a characteristic of inductively coupled plasma (ICP) etching equipment?
- In plasma tools such as capacitively coupled ones, what is the phenomenon called in which the wafer-side electrode naturally acquires a negative DC potential that accelerates ions toward the wafer?
- Which metric expresses how far the sidewall of an etched hole or trench tilts from vertical?
Related terms
Plasma ICP (inductively coupled plasma) Radical Self-bias ALE (atomic layer etching) Antenna effect ARDE (aspect-ratio-dependent etching) Ashing Aspect ratio Buffered hydrofluoric acid (BHF)