What is ICP (inductively coupled plasma)?
A method that generates a high-density plasma with RF current in a coil. It makes it easy to control plasma density and the energy of ions reaching the wafer independently.
Field: Etching
ICP (inductively coupled plasma) in the explanations
An ICP etcher drives RF current through a coil above or around the chamber to induce an electric field that sustains a dense plasma of 10¹¹–10¹² cm⁻³, while a separate RF supply biases the wafer.
Which is a characteristic of inductively coupled plasma (IC…Analyzing the collected liquid by ICP-MS or total-reflection X-ray fluorescence (TXRF) measures whole-wafer metal contamination with sensitivity around 10⁸–10⁹ atoms/cm².
To analyze metal contamination on a wafer surface with high…High-density ICP tools etch mesas for LEDs and lasers and gate recesses for HEMTs, using low ion energies to keep etch damage from degrading performance.
Which gases are commonly used for dry etching of GaN?
Questions that mention ICP (inductively coupled plasma) (3)
- Which is a characteristic of inductively coupled plasma (ICP) etching equipment?
- To analyze metal contamination on a wafer surface with high sensitivity, which preparation method dissolves the surface oxide with hydrofluoric acid vapor and collects it in a droplet for analysis?
- Which gases are commonly used for dry etching of GaN?
Related terms
Plasma Radical Anisotropic etching Native oxide TXRF (total reflection X-ray fluorescence) Dry etching GaN (gallium nitride) Wet etching ALE (atomic layer etching) Antenna effect