What is TMAH?
Tetramethylammonium hydroxide, a metal-ion-free organic alkali used as a photoresist developer. Care is needed because it can cause poisoning through skin absorption.
TMAH in the explanations
TMAH is an organic alkali containing no metal, so there is no risk of metal contamination, and it is used as the semiconductor developer.
What is the main reason organic alkalis such as TMAH, rathe…TMAH not only damages skin as a strong alkali, but tetramethylammonium ions absorbed through the skin can block signal transmission from nerves to muscles and cause respiratory arrest and the like.
Why is skin contact with concentrated TMAH (tetramethylammo…Representative types are novolak resins for i-line and chemically amplified resists for KrF and ArF, developed in alkaline TMAH solution.
Which correctly describes positive photoresist?
Questions that mention TMAH (4)
- What is the main reason organic alkalis such as TMAH, rather than sodium hydroxide, are used as semiconductor developers?
- Why is skin contact with concentrated TMAH (tetramethylammonium hydroxide), used in developers, considered especially dangerous?
- Which correctly describes positive photoresist?
- Which aqueous solution is commonly used to develop photoresist?
Related terms
Positive photoresist Photoresist Arsine (AsH3) Mass flow controller (MFC) NF3 (nitrogen trifluoride) Phosphine (PH3) Precursor Silane (SiH4) Specialty gases Ultrapure water