What is Radical?
A neutral atom or molecule with an unpaired electron that is highly reactive chemically. Plasmas contain far more radicals than ions, and they drive chemical etching and deposition.
Field: Etching
Radical in the explanations
Radical oxidation is used for 3D structures such as FinFET fins and 3D NAND and in steps with tight thermal budgets.
Which is a characteristic of radical oxidation, which uses …In structures like FinFETs, whose top and sidewalls have different orientations, oxide thickness would vary by location, so radical oxidation or ALD, which are less orientation-sensitive, are used.
How does the thermal oxidation rate of silicon depend on cr…Downstream (radical-only) ashers are common to avoid damage, and hydrogen-based plasmas replace oxygen over low-k films.
What is the process called that removes photoresist by oxid…
Questions that mention Radical (7)
- Which is a characteristic of radical oxidation, which uses oxygen radicals?
- How does the thermal oxidation rate of silicon depend on crystal orientation?
- What is the process called that removes photoresist by oxidizing it to ash with oxygen plasma or similar?
- Which is a characteristic of inductively coupled plasma (ICP) etching equipment?
- Why is cryogenic etching, which cools the wafer to very low temperatures, attracting attention for high-aspect-ratio processing?
- What is an advantage of pulsed plasma, which etches while switching the RF power on and off?
- In a typical etching plasma, how do the numbers of ions and radicals compare?
Related terms
Plasma Crystal orientation 3D NAND FinFET Thermal oxidation ALD Photoresist Ashing ICP (inductively coupled plasma) Anisotropic etching