What is ALE (atomic layer etching)?
Etching by alternating surface modification and removal so that each cycle removes about one atomic layer. It gives extremely precise control of etch depth.
Field: Etching
Etching by alternating surface modification and removal so that each cycle removes about one atomic layer. It gives extremely precise control of etch depth.
Field: Etching
ALE repeats self-limiting steps: first modify only the top surface layer, e.g., by chlorine adsorption, then remove just that layer with low-energy ions or similar.
Which is a characteristic of atomic layer etching (ALE)?ALD GAA (gate-all-around) Anisotropic etching Antenna effect ARDE (aspect-ratio-dependent etching) Ashing Aspect ratio Buffered hydrofluoric acid (BHF) Dry etching Endpoint detection