What is ARDE (aspect-ratio-dependent etching)?
The slowdown of etch rate in narrower, deeper features because ions and radicals reach the bottom less easily. Also called the microloading effect.
Field: Etching
ARDE (aspect-ratio-dependent etching) in the explanations
This aspect-ratio-dependent etching (ARDE, or microloading) leaves narrow holes shallower than wide ones on the same wafer, so depths vary with size.
What is the phenomenon called in which the etch rate decrea…
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Related terms
Aspect ratio ALE (atomic layer etching) Anisotropic etching Antenna effect Ashing Buffered hydrofluoric acid (BHF) Dry etching Endpoint detection Hard mask ICP (inductively coupled plasma)