Process materials (gases and chemicals)

Which aqueous solution is commonly used to develop photoresist?

  1. ATMAH (tetramethylammonium hydroxide) solution
  2. BHydrochloric acid
  3. CHydrofluoric acid
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Answer: A. TMAH (tetramethylammonium hydroxide) solution

Positive resists are typically developed with 2.38% aqueous TMAH. Areas made soluble in alkali by exposure dissolve, revealing the pattern.

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