Growing a film only in certain places by exploiting differences in the underlying materials. Because it can save lithography and etch steps, it is being researched and introduced for advanced interconnects.
Field: Deposition (CVD and PVD)
Area-selective deposition grows film only where needed—on metal but not on dielectric, for instance—by exploiting differences in reactivity between surface materials; surfaces to be protected can also be blocked with self-assembled monolayers (SAMs).
Which technique uses differences in surface materials to gr…ALD CVD Electroplating Electrostatic chuck HDP-CVD (high-density plasma CVD) LPCVD (low-pressure CVD) Magnetron sputtering PECVD (plasma-enhanced CVD) Reactive sputtering Spin coating