Process materials (gases and chemicals)

In ArF immersion lithography, which film is applied over the photoresist to keep the immersion water from contacting it directly?

  1. ABARC (bottom anti-reflective coating)
  2. BPellicle
  3. CTop coat
Show answer and explanation

Answer: C. Top coat

In immersion lithography, water between the lens and wafer contacts the resist, so resist components may leach into the water or water may penetrate the resist. A top coat is a protective film applied over the resist to prevent this. Some resists are designed so that no top coat is needed.

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