Process materials (gases and chemicals)

Which combination correctly lists the main components of chemically amplified photoresist?

  1. ABase resin, photoacid generator (PAG) and solvent
  2. BCopper particles and water
  3. CSingle-crystal silicon and oxygen
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Answer: A. Base resin, photoacid generator (PAG) and solvent

A chemically amplified resist consists of a base resin whose solubility in developer changes, a photoacid generator that produces acid on exposure, and a solvent for coating. It also contains additives such as quenchers that control acid diffusion.

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