What is Immersion lithography?
Exposure with the space between the lens and the wafer filled with water. It allows a numerical aperture above 1, so ArF excimer lasers can form finer patterns.
Field: Lithography
Immersion lithography in the explanations
Immersion lithography fills the roughly 1 mm gap between the final lens and wafer with ultrapure water (refractive index about 1.44 at 193 nm) instead of air (about 1).
Which correctly describes ArF immersion lithography?Immersion lithography therefore uses polarized illumination controlled to be TE relative to the line orientation.
In immersion lithography with very high numerical aperture …In immersion lithography, water between the lens and wafer contacts the resist, so resist components may leach into the water or water may penetrate the resist.
In ArF immersion lithography, which film is applied over th…
Questions that mention Immersion lithography (3)
Related terms
Numerical aperture (NA) Ultrapure water Photoresist ArF excimer laser Bottom anti-reflective coating (BARC) Chemically amplified resist Depth of focus (DOF) EUV lithography High-NA EUV Line edge roughness (LER)