Etching

What is the process called that removes photoresist by oxidizing it to ash with oxygen plasma or similar?

  1. AAshing
  2. BAnnealing
  3. CDicing
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Answer: A. Ashing

Ashing oxidizes the organic resist with oxygen plasma or similar, removing it as CO2 and H2O. It is done to remove resist after it has served as a mask for etching or ion implantation, followed by wet cleaning to remove residues.

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More Etching questions

  1. Which is a characteristic of atomic layer etching (ALE)?
  2. Which correctly describes one mechanism by which dry etching achieves anisotropy?
  3. Which solution is commonly used for wet etching of silicon nitride?
  4. During plasma etching, what is the phenomenon called in which conductors acting as antennas, such as long wires, collect charge and damage the gate oxide they connect to?
  5. Which is a characteristic of wet etching of silicon with potassium hydroxide (KOH) solution?