What is HDP-CVD (high-density plasma CVD)?
CVD using a high-density plasma that deposits while ion sputtering trims film at the trench openings. It has been used to fill narrow trenches with insulator without voids.
Field: Deposition (CVD and PVD)
HDP-CVD (high-density plasma CVD) in the explanations
HDP-CVD deposits from a dense plasma (above 10¹¹ cm⁻³) while ions such as argon, drawn in by substrate bias, sputter the corners at an angle, so the trench fills from the bottom up.
Why has high-density plasma CVD (HDP-CVD) been used to fill…
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Related terms
CVD Plasma STI (shallow trench isolation) ALD Area-selective deposition Electroplating Electrostatic chuck LPCVD (low-pressure CVD) Magnetron sputtering PECVD (plasma-enhanced CVD)