What is Magnetron sputtering?

Sputtering with magnets behind the target that trap electrons near it and raise plasma density. It increases deposition rate and is the mainstream sputtering method today.

Field: Deposition (CVD and PVD)

Questions that mention Magnetron sputtering (1)

  1. What is the main purpose of placing magnets behind the target in magnetron sputtering?

Related terms

Plasma Erosion ALD Area-selective deposition CVD Electroplating Electrostatic chuck HDP-CVD (high-density plasma CVD) LPCVD (low-pressure CVD) PECVD (plasma-enhanced CVD)

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