What is Reactive sputtering?
Sputtering a metal target in an atmosphere containing a reactive gas such as nitrogen or oxygen to form nitride or oxide films. It is used for films such as titanium nitride (TiN).
Field: Deposition (CVD and PVD)
Reactive sputtering in the explanations
In reactive sputtering, increasing reactive gas eventually coats the target surface itself with nitride or oxide.
In reactive sputtering, what is the phenomenon called in wh…Reactive sputtering adds reactive gases such as nitrogen or oxygen to argon so that sputtered metal reacts to form nitride or oxide films.
What is the method called that sputters a titanium target i…
Questions that mention Reactive sputtering (2)
- In reactive sputtering, what is the phenomenon called in which, with too much reactive gas flow, the target surface becomes covered with a compound and the deposition rate drops sharply?
- What is the method called that sputters a titanium target in a nitrogen-containing gas to form titanium nitride (TiN) films?
Related terms
Plasma ALD Area-selective deposition CVD Electroplating Electrostatic chuck HDP-CVD (high-density plasma CVD) LPCVD (low-pressure CVD) Magnetron sputtering PECVD (plasma-enhanced CVD)