What is CD-SEM?
A scanning electron microscope for measuring pattern line widths (critical dimensions). Used for dimensional control after lithography and etching.
Field: Metrology and analysis
CD-SEM in the explanations
CD-SEM and scatterometry measure it.
What does "CDU", controlled in lithography, mean?
Questions that mention CD-SEM (3)
- When ArF resist patterns are measured with a CD-SEM, what is the phenomenon called in which electron-beam irradiation makes the patterns shrink?
- What is the approach called that combines data from multiple measurement methods (optical, CD-SEM, AFM and so on) to determine dimensions and shapes more accurately than any single method?
- What does "CDU", controlled in lithography, mean?
Related terms
AFM (atomic force microscope) Defect inspection system EDX (energy-dispersive X-ray spectroscopy) Ellipsometry FIB (focused ion beam) Four-point probe method SEM (scanning electron microscope) SIMS (secondary ion mass spectrometry) TEM (transmission electron microscope) TXRF (total reflection X-ray fluorescence)