Lithography
Which correctly describes double patterning (multiple patterning)?
- ATwo wafers are exposed at once
- BPatterns with a pitch too fine to resolve in one exposure are formed in multiple exposure and processing steps
- CCoating two layers of resist doubles the resolution
Show answer and explanation
Answer: B. Patterns with a pitch too fine to resolve in one exposure are formed in multiple exposure and processing steps
Double patterning forms patterns too fine to resolve in one exposure by splitting them into two sparser patterns that are exposed and processed separately, or by using spacers deposited on sidewalls. Because it adds steps and raises cost, EUV lithography has been introduced.