What is Preston's equation?

The empirical rule that the CMP removal rate is proportional to the product of polishing pressure and the relative speed between pad and wafer.

Field: CMP and cleaning

Preston's equation in the explanations

Questions that mention Preston's equation (3)

  1. In Preston's equation for CMP removal rate, which quantity is the removal rate proportional to?
  2. What is the main purpose of a CMP head that can vary the pressure pressing the wafer in several concentric zones?
  3. Which equation is used to determine film stress from the change in wafer bow before and after deposition?

Related terms

CMP Slurry Black's equation Electromigration Ceria (cerium oxide) Dilute hydrofluoric acid (DHF) Dishing Erosion Megasonic cleaning Native oxide

Back to the glossary