Lithography
Which correctly describes writing patterns directly into resist on the wafer with an electron beam, without a mask?
- AIt is the fastest method for volume production
- BIt needs no mask and can write very fine patterns, but writing takes so long that it is unsuited to mass production
- CIt cannot write patterns
Show answer and explanation
Answer: B. It needs no mask and can write very fine patterns, but writing takes so long that it is unsuited to mass production
Electron-beam direct writing scans the beam to draw patterns one by one, so very fine patterns can be formed without a mask. But writing takes a long time, so it is unsuited to mass production and is used for research and development, small-volume prototypes, photomask making and similar.
- A. Because it draws patterns serially, it is slow for volume production.
- B. Correct. No mask is needed, but writing takes time.
- C. It can write patterns.