What is Refractive index?

The speed of light in vacuum divided by its speed in a material. At a wavelength of 1.55 µm, silicon is about 3.48 and oxide (SiO2) about 1.45; the larger this contrast, the more tightly light can be confined in a small waveguide.

Japanese name: 屈折率

Refractive index appears in 11 practice questions across 5 topics, including Silicon photonics, Epitaxial growth, Lithography.

Silicon waveguide cross-sections (strip and rib) SiO₂ (n ≈ 1.45) Si (n ≈ 3.5) Optical mode SiO₂ cladding Buried oxide (BOX) Si substrate Width ~500 nm t = 220 nm SiO₂ cladding Buried oxide (BOX) Si substrate Width ~500 nm Slab Strip waveguide Rib waveguide Strong confinement, tight bends Slab connects to electrodes
Silicon waveguide cross-sections (strip and rib) · View in diagrams

Field: Silicon photonics

Try it: questions about Refractive index

Which correctly describes a silicon waveguide (refractive index about 3.5) surrounded by oxide (SiO2, refractive index about 1.45)?

  1. AThe large index contrast lets light leak out easily, so the waveguide can only be bent at radii larger than an optical fiber's, making it unsuitable for integration
  2. BThe large index contrast confines light tightly, so it can be bent at small radii of a few µm and devices can be packed densely
  3. CThe larger the index contrast, the less sensitive it is to sidewall roughness, so propagation loss becomes as low as an optical fiber's
Show answer and explanation

Answer: B. The large index contrast confines light tightly, so it can be bent at small radii of a few µm and devices can be packed densely

Light is confined by total internal reflection at the boundary between the high-index core and the low-index surroundings (cladding), and the larger the index contrast, the tighter the confinement. The difference between silicon and oxide is about 2, orders of magnitude larger than the core–cladding difference in optical fiber (less than 1%), allowing thin waveguides with cross-sections of about 0.5 µm × 0.22 µm and bend radii down to a few µm. On the other hand, the larger the index contrast, the more sidewall roughness scatters light, so propagation loss—though condition-dependent—is about 1–3 dB/cm for a typical strip waveguide (lower for rib waveguides or low-loss processes), far greater than fiber's (about 0.2 dB/km).

When light travels from silicon (refractive index 3.48) toward oxide (refractive index 1.45), which is closest to the critical angle for total internal reflection (measured from the normal to the interface)?

  1. AAbout 65°
  2. BAbout 25°
  3. CAbout 45°
Show answer and explanation

Answer: B. About 25°

The critical angle θc is given by sinθc = n2 / n1; 1.45 ÷ 3.48 ≈ 0.417 gives θc ≈ 24.6°, or about 25°. Light striking the interface at angles greater than 25° from the normal does not exit into the oxide and is totally reflected. Total internal reflection occurs only when light travels from the higher-index side to the lower-index side, not in the reverse direction. In optical fiber, where the index contrast is small, the critical angle is large, 80° or more, so only light striking the boundary at shallow angles is confined. About 65° is the value obtained by mistakenly measuring the angle from the interface.

Refractive index in the explanations

Questions that mention Refractive index (11)

  1. Which correctly describes a silicon waveguide (refractive index about 3.5) surrounded by oxide (SiO2, refractive index about 1.45)?
  2. When light travels from silicon (refractive index 3.48) toward oxide (refractive index 1.45), which is closest to the critical angle for total internal reflection (measured from the normal to the interface)?
  3. Why is the carrier dispersion effect (plasma dispersion effect) used to change the refractive index with an electrical signal in silicon optical modulators?
  4. Why is an inverse taper, in which the silicon waveguide narrows toward the chip edge, used in edge couplers?
  5. Why do high-speed silicon modulators often use the depletion type, which applies reverse bias to the pn junction of the phase shifter to vary the depletion width?
  6. Why do optical circuits using ring resonators often place a heater near the ring to control its temperature?
  7. Silicon photonics sometimes combines silicon nitride (SiN) waveguides with silicon waveguides. Which correctly describes SiN waveguides?
  8. Which method measures the thickness of a lightly doped epitaxial layer on a heavily doped substrate using infrared interference?
  9. Which correctly describes ArF immersion lithography?
  10. Which gas is sometimes used as the oxidant with silane to deposit silicon oxide or oxynitride films by CVD?
  11. What is mainly measured by ellipsometry (spectroscopic ellipsometry)?

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Related terms

Waveguide Propagation loss Plasma dispersion effect Single-mode fiber Junction capacitance (depletion capacitance) Forward bias C-band Ring resonator Silicon photonics Band gap

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