What is EOT (equivalent oxide thickness)?

The thickness of SiO2 that would give the same gate capacitance as a gate insulator such as a high-k film. A physically thick film can have a small EOT, giving high capacitance while limiting tunneling current.

Field: Advanced transistors (FinFET and GAA)

EOT (equivalent oxide thickness) in the explanations

Questions that mention EOT (equivalent oxide thickness) (7)

  1. Which correctly describes EOT (equivalent oxide thickness)?
  2. Which value is closest to the relative permittivity of silicon?
  3. In a MOSFET with a very thin gate insulator, what is the effect of the electron distribution in the inversion layer peaking slightly away from the interface?
  4. In high-k/metal gate transistors, why is a very thin layer such as SiO2 often placed between the silicon and the high-k film (such as hafnium oxide)?
  5. What is the main purpose of introducing nitrogen into the gate oxide to make an oxynitride (SiON)?
  6. Which value is closest to the relative permittivity of SiO2 formed by thermal oxidation?
  7. What is the treatment called that introduces plasma-generated nitrogen into the surface of a thin gate oxide?

Related terms

Oxynitride (SiON) Mobility Junction capacitance (depletion capacitance) Inversion layer Annealing Threshold voltage Thermal oxidation Plasma CFET (complementary FET) DTCO (design-technology co-optimization)

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