Advanced transistors (FinFET and GAA)

Which correctly describes EOT (equivalent oxide thickness)?

  1. AThe thickness of an SiO2 film that would give the same gate capacitance as a gate insulator such as a high-k film
  2. BThe actual physical thickness of the gate insulator
  3. CThe thickness of the wiring layers
Show answer and explanation

Answer: A. The thickness of an SiO2 film that would give the same gate capacitance as a gate insulator such as a high-k film

EOT converts the gate capacitance of a gate insulator into the SiO2 thickness that would give the same capacitance. A high-k film with about five times the permittivity of SiO2 gives the same capacitance at a physical thickness about five times the EOT, and the thicker film suppresses tunneling current.

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More Advanced transistors (FinFET and GAA) questions

  1. Which correctly describes the SOI (silicon on insulator) structure?
  2. Which correctly describes DIBL (drain-induced barrier lowering)?
  3. How is the effective channel width of a FinFET adjusted?
  4. Which correctly describes the CFET (complementary FET), researched as the structure to follow GAA?
  5. In high-k/metal gate transistors, which is one of the main ways to adjust the threshold voltage?