Oxidation and diffusion
Which value is closest to the relative permittivity of SiO2 formed by thermal oxidation?
- AAbout 1
- BAbout 3.9
- CAbout 25
Show answer and explanation
Answer: B. About 3.9
The relative permittivity of SiO2 is about 3.9. Hafnium oxide, a high-k material, is about 20–25, and low-k materials are generally 3 or below. The SiO2 value is often used as the reference when comparing dielectric constants.