Numbers Every Chip Engineer Should Know

The orders of magnitude worth carrying in your head, from silicon's band gap to DRAM latency. Each value links to a practice question with a full explanation. Values are typical figures; the notes give the conditions.

Test yourself: 10 questions

Materials & physics

QuantityValuePractice
Band gap of Si (300 K)Sets silicon's absorption edge near 1.1 µm.≈ 1.12 eVPractice
Band gap of Ge (room temp.)Absorption edge near 1.9 µm, useful for infrared detection.≈ 0.66 eVPractice
Band gap of GaAs (room temp.)A direct gap; GaAs emits near-infrared light at about 870 nm.≈ 1.42 eVPractice
Band gap of SiC / GaN4H-SiC, the power-device polytype, is about 3.26 eV.≈ 3.3 eV / ≈ 3.4 eVPractice
Thermal voltage kT/q (300 K)Precisely about 0.0259 V at 300 K.≈ 26 mVPractice
Intrinsic density ni of Si (room temp.)Sources quote 1.0–1.5×10¹⁰ cm⁻³.≈ 1×10¹⁰ cm⁻³Practice
Electron / hole mobility in SiLightly doped silicon at room temperature; electrons are about three times faster.≈ 1400 / ≈ 450 cm²/(V·s)Practice
Lattice constant of SiDiamond-structure cubic cell holding eight atoms.≈ 0.543 nmPractice
Atomic density of SiA 1×10¹⁶ cm⁻³ dopant level is one atom in five million.≈ 5×10²² cm⁻³Practice
Photon energy vs. wavelengthGaN's 3.4 eV corresponds to about 365 nm.E [eV] ≈ 1240 / λ [nm]Practice

Devices & circuits

QuantityValuePractice
Subthreshold swing limit (room temp.)Lowering Vth by ΔV multiplies subthreshold current by 10^(ΔV/S); at the ideal 60 mV/dec, 60 mV gives 10×.≈ 60 mV/decPractice
Threshold voltage, advanced logicWith other conditions fixed, 0.1 V lower Vth raises subthreshold current by 10^(0.1 V / S): about 18× at S = 80 mV/dec.≈ 0.2–0.4 VPractice
Gate EOT, advanced devicesIncludes the interfacial layer; measured CET is somewhat larger.≈ 0.8–1 nmPractice
Relative permittivity: SiO₂ / HfO₂SiON is about 5–6 and Si3N4 about 7.≈ 3.9 / ≈ 20–25Practice
Breakdown field of thermal SiO₂Devices run at a few MV/cm or less to last ten years.≈ 10 MV/cmPractice
Si diode forward voltage / BJT VBEVoltage at which a practical (mA-level) current flows at room temperature.≈ 0.6–0.7 VPractice
Diode VF / VBE temperature coefficientAt constant current; used in on-chip temperature sensors.≈ −2 mV/°CPractice
Ideal SNR of an N-bit ADC (full-scale sine)Quantization noise only, integrated from DC to fs/2. About 74 dB at 12 bits and 98 dB at 16 bits.≈ 6.02N + 1.76 dBPractice

Memory

QuantityValuePractice
DRAM refresh window (DDR4, 0–85 °C)Every row is refreshed within this window; 32 ms at 85–95 °C. DDR5 uses 32 ms (16 ms when hot). Average command spacing tREFI ≈ 7.8 µs for DDR4.≈ 64 msPractice
DRAM cell capacitance0 and 1 differ by only tens of thousands of electrons.≈ 10 fFPractice
Cell area: DRAM 1T1C vs. 6T SRAMDRAM packs roughly 20 times denser.≈ 6F² vs. ≈ 120–150F²Practice
NAND flash endurance (P/E cycles)SLC ≈ 100,000 · TLC a few thousand · QLC ≈ 1,000Practice
Flash data retention (example)Depends on product, wear and temperature: one SSD is rated 10 years at beginning of life but 1 year at end of life (25 °C).≈ 10 years when newPractice

Lithography & fab

QuantityValuePractice
EUV wavelengthAbout 92 eV per photon, roughly 14 times ArF's photon energy.13.5 nmPractice
ArF excimer wavelength193 nm (immersion NA up to 1.35)Practice
EUV numerical apertureHigh-NA improves resolution about 1.7×.0.33 → 0.55 (High-NA)Practice
Standard wafer diameter / thicknessA 300 mm wafer weighs about 128 g.300 mm / ≈ 775 µmPractice
ISO Class 5 cleanroom limitEach class step is a factor of 10; room air is around Class 9.≤ 100,000 particles (≥ 0.1 µm) per m³Practice
Melting point of SiThermal oxidation runs at about 800–1,200 °C.≈ 1414 °CPractice
Front-end cycle time, leading-edge logicOver a thousand process steps.≈ 3 months or morePractice

Computer systems

QuantityValuePractice
Period of a 1 GHz clock1 ns (light travels ≈ 30 cm)Practice
L1 cache hitCapacity: tens of KB.≈ 1 ns (a few cycles)Practice
L2 cache hitL3 takes over ten ns (tens of cycles).a few nsPractice
DRAM (main memory) accessHundreds of cycles for a CPU running at several GHz.≈ 100 nsPractice
SSD access≈ tens to 100 µsPractice
HDD accessSeek plus rotational delay; SSD random access is hundreds of times faster.several msPractice
Cache line sizeOne DDR4 BL8 burst on a 64-bit channel: 8 transfers × 8 bytes, excluding ECC.64 bytesPractice
Page size / huge page (x86-64)A 64-entry TLB would cover 256 KiB with 4 KiB pages or 128 MiB with 2 MiB pages; real TLB sizes differ by design.4 KiB / 2 MiBPractice

Interconnect & packaging

QuantityValuePractice
Cu / Al resistivity (bulk, room temp.)≈ 1.7 / ≈ 2.7 µΩ·cmPractice
CTE: Si vs. organic substrateGlass/epoxy laminate below Tg; through-thickness CTE is much larger and low-CTE package laminates are lower. Si is about 2.6×10⁻⁶ /K.≈ 3 vs. ≈ 15–17 ppm/K (in-plane)Practice
Pitch: microbumps vs. hybrid bondingMicrobump pitches near 10 µm have been shown in research. Connection count scales with 1/pitch².typically tens of µm vs. < 10 µmPractice
HBM3 bandwidth per stack6.4 Gb/s per pin.≈ 819 GB/s (1,024-bit bus)Practice
PCIe per-lane rate, Gen 3 → Gen 6Roughly doubles each generation.8 → 16 → 32 → 64 GT/sPractice

Reliability & power

QuantityValuePractice
1 FIT1 failure per 10⁹ device-hoursPractice
Typical design-life targetAlways tied to a stated junction temperature and duty cycle, e.g. 10 years continuous at Tj = 105 °C for some industrial processors.≈ 10 yearsPractice
Temperature rule of thumbHolds roughly near room temperature for Ea ≈ 0.5 eV.Lifetime ≈ ½ per +10 °CPractice
ESD robustness target (human body model)Industry bodies now recommend 1 kV HBM for many ICs with proper ESD controls; use the device's qualification rating.≈ 2 kV (common legacy target)Practice
Max junction temp., Si power devicesDesigns typically operate around 125 °C for margin.150–175 °CPractice
Breakdown field of SiC≈ 3 MV/cm (≈ 10× Si)Practice
CMOS dynamic powerHalving the supply voltage cuts dynamic power to a quarter.P = αCV²fPractice

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