What is Implant dose?

The number of ions implanted per unit area in ion implantation, expressed in cm⁻². It is set by beam current and implant time.

Field: Ion implantation

Questions that mention Implant dose (1)

  1. Under the same annealing conditions, how does the sheet resistance of the implanted layer generally change when the implant dose is increased?

Related terms

Annealing Mobility Solid solubility Yield Channeling Faraday cup Halo implant (pocket implant) Ion implantation Laser anneal Plasma doping

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