Metrology and analysis

What are the main uses of focused ion beam (FIB) systems?

  1. AMachining tiny areas, preparing cross-section samples and modifying circuits
  2. BMeasuring film thickness over the whole wafer
  3. CCleaning wafers
Show answer and explanation

Answer: A. Machining tiny areas, preparing cross-section samples and modifying circuits

An FIB focuses ions such as gallium onto a sample to mill a target location with nanometer precision, or deposit films when combined with gases. It is used to prepare thin lamellae for TEM, observe cross-sections of defect sites, and modify the wiring of prototype chips.

Practice this topic Back to topic

More Metrology and analysis questions

  1. Which analysis method determines surface elements and their chemical bonding states from the energies of photoelectrons emitted under X-ray irradiation?
  2. Which analysis technique locates failures in an LSI by detecting faint light emitted from defective sites during operation?
  3. When ArF resist patterns are measured with a CD-SEM, what is the phenomenon called in which electron-beam irradiation makes the patterns shrink?
  4. What is placed on the wafer to measure overlay error?
  5. Which technique directs X-rays at a very shallow angle and determines thin-film thickness and density from oscillations in reflectivity?