Lithography

Which method develops a positive chemically amplified resist with an organic solvent, dissolving the unexposed areas?

  1. APositive-tone development
  2. BEUV exposure
  3. CNegative-tone development (NTD)
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Answer: C. Negative-tone development (NTD)

In negative-tone development, a positive resist is used, but an organic-solvent developer dissolves the unexposed areas and leaves the exposed areas. For narrow trenches and small holes, image contrast is better when less area is bright, so it is used in ArF immersion lithography and similar processes.

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