Process materials (gases and chemicals)

Which correctly describes chlorine trifluoride (ClF3), used for chamber cleaning and similar purposes?

  1. AIt is inert and reacts with almost nothing
  2. BIt is extremely reactive, reacting violently with many substances, and requires strict handling
  3. CIt is harmless and needs no ventilation
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Answer: B. It is extremely reactive, reacting violently with many substances, and requires strict handling

ClF3 is an extremely reactive gas that can etch many materials even without plasma, so it is used for chamber cleaning and similar tasks. On the other hand, it reacts violently with many materials, sometimes igniting them, and is highly toxic, so it is used under strict control.

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