Deposition (CVD and PVD)
For films of the same material, in what way are high-temperature thermal CVD films generally better than plasma CVD films?
- ALower deposition temperature
- BAlways faster deposition
- CDenser films with fewer impurities such as hydrogen
Show answer and explanation
Answer: C. Denser films with fewer impurities such as hydrogen
In high-temperature thermal CVD, the sources react fully and form dense films with few impurities, such as hydrogen, from the source gases. Plasma CVD can deposit at low temperatures but tends to contain more hydrogen and produce less dense films. They are chosen according to the application and the temperature limits of the process.