Deposition (CVD and PVD)
What is the most appropriate range for the thickness of thin films handled in semiconductor manufacturing?
- AA few nanometers to a few micrometers
- BA few millimeters to a few centimeters
- CA few meters
Show answer and explanation
Answer: A. A few nanometers to a few micrometers
Films deposited in LSI manufacturing range from a few nanometers, like gate insulators, to hundreds of nanometers or a few micrometers, like wiring and insulating layers. 1 nm is 10⁻⁹ m and 1 µm is 10⁻⁶ m.
- A. Correct. They are thin films from a few nanometers to a few micrometers.
- B. Millimeters or more is thicker than the wafer, not a thin film.
- C. Meters is the scale of the manufacturing tools.