Deposition (CVD and PVD)

What is the approximate film thickness deposited in one ALD cycle?

  1. AAbout 1 µm
  2. BAbout 0.1 nm (about one atomic layer or less)
  3. CAbout 100 nm
Show answer and explanation

Answer: B. About 0.1 nm (about one atomic layer or less)

One ALD cycle deposits about one atomic layer or less, roughly 0.1 nm. Even a film of a few nm therefore needs dozens of cycles, making deposition slow. In return, thickness can be controlled precisely by the number of cycles.

Practice this topic Back to topic

More Deposition (CVD and PVD) questions

  1. What is an advantage of vacuum evaporation that heats material with an electron beam?
  2. Which technique uses differences in surface materials to grow films only in specific places?
  3. What is the most appropriate range for the thickness of thin films handled in semiconductor manufacturing?
  4. Which correctly describes the basic way an LSI is built in manufacturing?
  5. What is the main reason many deposition processes are carried out in vacuum equipment?